EQP Systems for Plasma Applications in Etching-Deposition-Coating-Process
Development
TCP-Transformer
coupled Plasma
Plasma
Immersion Ion Implantation
*
The high energy range option of 1000eV is suited for this application.
Components to
provide for externally floating the EQP to 10KeV are available.
* The EQP is
configured with a 300 micron sampling orifice to match a low
plasma
pressure to the EQP system.
Hybrid
Applications
The latest plasma processing technology
often includes a coupling of plasma sources, ECR source with
RF driven substrate for example. The EQP's configurationsare
comprehensive and meet the most demanding plasma sampling requirements.
The configuration of the EQP is flexible to enable an EQP System
to be applied safely to a wide range of plasma applications
and experiments.
EQP Systems for Plasma Applications in Etching-Deposition-Coating-Process
Development 
