EQP Systems for Plasma Applications in Etching-Deposition-Coating-Process
Development
|
|
| ECR-
Electron Cyclotron Resonance |
 |
| Magnetron
Source |
 |
| Helicaon
Source |
| *
Front end sampling tube magnetic shielding, up to 200 Gauss,
is required in most |
| Helicon applications |
| *
Driven electrode sampling option for RF biased substrate applications |
| *
Water cooling of the sampling orifice should be considered for
high density plasma |
| source studies. |
|
