EQP Systems for Plasma Applications in Etching-Deposition-Coating-Process
Development
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DC Glow Discharge Plasma
Pulsed
Plasma & Laser Ablation
*
The EQP standard gating input provides for time resolved analysis
within a plasma
pulse or laser ablation plasma plume.
*
Sampling time within a pulse or plasma plume can be as short
as 1second.
*
The EQP data accumulation mode provides for time averaged spectra
to be
accumulated over user specified periods.
ICP-Inductively
Coupled plasma.
*
Electrically isolated front end to sample atthe
floating potential. *
Driven electrode option to mimic substrate conditions in deposition
or etching applications
EQP Systems for Plasma Applications in Etching-Deposition-Coating-Process
Development 
